熱門關鍵詞: 高低溫試驗箱 恒溫恒濕試驗箱 步入式恒溫恒濕實驗室 高壓加速老化試驗箱 冷熱沖擊試驗箱
近幾年來,本(ben)實驗室連續開展了大規(gui)模集成電(dian)(dian)(dian)路(lu)(lu)(lu)的(de)新品檢測(ce)(ce)工作,如偵察運算電(dian)(dian)(dian)路(lu)(lu)(lu)、BCH編譯碼器、CRT地(di)址產生(sheng)電(dian)(dian)(dian)路(lu)(lu)(lu)及接(jie)口電(dian)(dian)(dian)路(lu)(lu)(lu)等(deng),基本(ben)上都(dou)是規(gui)模較大的(de)CMOS電(dian)(dian)(dian)路(lu)(lu)(lu),對靜電(dian)(dian)(dian)敏感,工作速度(du)較快(kuai)。在(zai)高(gao)(gao)、低(di)溫(wen)(wen)電(dian)(dian)(dian)性能(neng)測(ce)(ce)試中成功地(di)采用(yong)了該(gai)集成電(dian)(dian)(dian)路(lu)(lu)(lu)高(gao)(gao)、低(di)溫(wen)(wen)電(dian)(dian)(dian)性能(neng)測(ce)(ce)試系(xi)統,積累了一些(xie)有益的(de)經驗。通過實際應用(yong)發現,必須注(zhu)意以下一些(xie)具體的(de)環節,如測(ce)(ce)試板(ban)的(de)隔(ge)離(li)、防潮,被測(ce)(ce)器件的(de)靜電(dian)(dian)(dian)保(bao)護,被測(ce)(ce)器件芯(xin)片溫(wen)(wen)度(du)的(de)確定等(deng)問題,才能(neng)快(kuai)速、準確地(di)完成CMOS VLSI的(de)高(gao)(gao)、低(di)溫(wen)(wen)電(dian)(dian)(dian)性能(neng)測(ce)(ce)試。
在用該高、低溫(wen)(wen)(wen)測(ce)試(shi)系(xi)統(tong)(tong)做溫(wen)(wen)(wen)度(du)(du)測(ce)試(shi)時(shi)(shi)(shi)(shi),系(xi)統(tong)(tong)有溫(wen)(wen)(wen)度(du)(du)傳感(gan)器(qi)(qi)叮測(ce)到(dao)(dao)器(qi)(qi)件(jian)底部的(de)溫(wen)(wen)(wen)度(du)(du),雖然氣流是(shi)(shi)重(zhong)直于DUT表(biao)面而下,但DUT的(de)底部還是(shi)(shi)屬于器(qi)(qi)件(jian)表(biao)面,如何(he)確定DUT芯(xin)(xin)片(pian)溫(wen)(wen)(wen)度(du)(du)的(de)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian),是(shi)(shi)個比較復雜(za)的(de)問題。因為DUT芯(xin)(xin)片(pian)溫(wen)(wen)(wen)度(du)(du)的(de)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian)受很多因系(xi)的(de)影響,如DUT的(de)材料(liao)、形狀尺(chi)寸,溫(wen)(wen)(wen)度(du)(du)以(yi)及氣體流量的(de)大(da)小等因素的(de)影響。不同的(de)器(qi)(qi)件(jian)芯(xin)(xin)片(pian)溫(wen)(wen)(wen)度(du)(du)的(de)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian)是(shi)(shi)不一樣(yang)的(de),溫(wen)(wen)(wen)度(du)(du)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian)是(shi)(shi)指(zhi)系(xi)統(tong)(tong)變溫(wen)(wen)(wen)( 升溫(wen)(wen)(wen)獲(huo)降溫(wen)(wen)(wen))開始,到(dao)(dao)建(jian)(jian)立(li)新的(de)熱平衡,即被測(ce)器(qi)(qi)件(jian)芯(xin)(xin)片(pian)溫(wen)(wen)(wen)度(du)(du)達到(dao)(dao)設定值這(zhe)一段時(shi)(shi)(shi)(shi)間(jian)。某公司給(gei)出了(le)1000Ω電阻溫(wen)(wen)(wen)度(du)(du)探測(ce)器(qi)(qi)(RTD)的(de)溫(wen)(wen)(wen)度(du)(du)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian)曲線,如圖(tu)3所示。圖(tu)3表(biao)明(ming)不同的(de)RTD其溫(wen)(wen)(wen)度(du)(du)建(jian)(jian)立(li)時(shi)(shi)(shi)(shi)間(jian)是(shi)(shi)不同的(de)。
DUT芯(xin)(xin)片(pian)(pian)溫(wen)度(du)的(de)建立(li)時(shi)(shi)間對于高(gao)、低溫(wen)測(ce)試(shi)是非常重(zhong)要的(de)指(zhi)標,只有在(zai)大于建立(li)時(shi)(shi)間的(de)時(shi)(shi)間段(duan)內測(ce)試(shi),測(ce)試(shi)的(de)數(shu)據才能(neng)真正地反映設(she)定(ding)溫(wen)度(du)點的(de)性(xing)能(neng)及具(ju)有重(zhong)復(fu)性(xing)。對于復(fu)雜的(de)大規模集成電(dian)路(lu),我(wo)們采取在(zai)開(kai)始(shi)高(gao)、低溫(wen)測(ce)試(shi)前,通(tong)過(guo)反復(fu)試(shi)驗(yan),確(que)(que)定(ding)被(bei)測(ce)器(qi)件芯(xin)(xin)片(pian)(pian)溫(wen)度(du)的(de)建立(li)時(shi)(shi)間。在(zai)熱流系(xi)統顯(xian)示達(da)到設(she)定(ding)溫(wen)度(du)開(kai)始(shi),對被(bei)測(ce)器(qi)件進行多次(ci)電(dian)參數(shu)測(ce)試(shi),當(dang)其電(dian)參數(shu)趨(qu)于穩定(ding)并(bing)具(ju)有可重(zhong)復(fu)性(xing)時(shi)(shi),將這段(duan)時(shi)(shi)間確(que)(que)定(ding)為DUT芯(xin)(xin)片(pian)(pian)溫(wen)度(du)的(de)建立(li)時(shi)(shi)間。經過(guo)反復(fu)試(shi)驗(yan)發現,系(xi)統的(de)溫(wen)度(du)傳感器(qi)測(ce)得的(de)被(bei)測(ce)器(qi)件底部溫(wen)度(du)與芯(xin)(xin)片(pian)(pian)溫(wen)度(du)基本一致。
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